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 Origin |
Korea |
| Model Number |
WEE 300 |
The Bluecord wafer edge exposure provides the function exposing UV light on the wafer edge according to a certain recipe.
It exposes the edge of a wafer as much as compensated eccentric after scanning a wafer.
The model WEE300 increases processing efficiency by removing photo resist around edge of the wafer.
- Fast finding wafer notch (Non-contact type)
- Fastest cycle time (High throughput)
- High reliability and repeatability
- Easy to use and install
- Low cost
- Easy to change a lamp
- Possible to control individual unit
- Compact footprint
- Compact controller
- Class 1 clean room compatible
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Wafer size
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12 or 8 inch manual change |
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Exposure mode
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Round |
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Exposure method
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Light-guide control, projection-lens
exposure sys. |
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Wavelength
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196 ~ 248 mm |
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Exposure width
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0 ~ 10 mm |
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Exposure accuracy
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Centering: +/-0.05 mm, Angle: +/-0.1
degrees |
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Resist slope
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Less than 4 mili-micron |
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Throughput
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Round: 180 wafers/hour |
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Lamp housing
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SP7-250DA (deep UV reflecting mirror
type) |
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Light source
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Deep UV lamp (UXM-Q256BY) |
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Lamp life
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2000 hours(80% of initial UV irradiance) |
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Interface
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RS232C or RS485 |
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Markets
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North America , Europe , Indian
sub-continent , Mideast , Asia Pacific , Africa , Latin America (South and
Central America) , Western Europe , Eastern Europe , East Asia , Southeast
Asia , Oceania |
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Sample Available
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No |
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 Size |
496.5 x 480 x 1202 Millimeters |
| Packaging |
1 set per carton box |
| Delivery lead time |
30 Days |
| Minimum order |
1 Set |
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